Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components

Product Details
Customization: Available
Model No.: 12039-83-7
Einecs: 234-904-3
Manufacturer/Factory, Trading Company
Diamond Member Since 2016

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Registered Capital
500000 RMB
Plant Area
<100 square meters
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
  • Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
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  • Overview
  • Company Profile
Overview

Basic Info.

Model NO.
12039-83-7
Function
Heat Resistance
Appearance
Powder
Color
Black
Density
4.39 g/cm3
Melting Point
1540ºC
Boiling Point
1540ºC
MW
104.03800
Transport Package
1kg/Bag
Specification
nanoscale
Trademark
Lonwin
Origin
China
Production Capacity
1000ton/Year

Product Description

Features
 
CAS No.:  12039-83-7
Molecular Formula:  TiSi2
Quality Standard:  99.9%
Minimum Order:  Depends on your requirement
Density: 4,39 g/cm3
Boiling Point: 1540ºC
Melting Point: 1540ºC
Molecular Weight: 104.03800
Specific Gravity: 4.39
RIDADR: UN3178
Packaging Group: III
Hazard Class: 4.1

Specification

 
Titanium Disilicide
Item No. Product Information
  Product Specification Microstructure Appearance
LW-TiSi2-01 1 um Irregularity Ash Black
LW-TiSi2-02 5 um Irregularity Ash Black
LW-TiSi2-03 8 um Irregularity Ash Black
LW-TiSi2-04 12 um Irregularity Ash Black
LW-TiSi2-05 20 um Irregularity Ash Black
 
Product picture
Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components

Applications

1. Titanium silicide has a broad prospect of use in the field of microelectronics because of its low film resistivity, high melting point and stable chemical properties;
2. Aerospace and aviation industry, ship and submarine manufacturing, medical use, jewellery manufacturing;
3.Titanium disilicide has the advantages of low resistivity, high temperature resistance and good stability, etc. It can be widely used in microelectronics, aerospace high-temperature resistant materials and coating materials, etc., and has gradually become a hot spot for research in related fields.

Package:
Packed in fiber drum and lining with polyethylene film bag. Net weight 25kg per drum.

Storage:
Keep the receptacle sealed and stored in a cool and dry place, and ensure that the working room has good ventilation or exhaust device.

Company Profile

Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components
Lonwin Chemical Industry Group is a leading 3D printing metal powder manufacturer in China, focusing on the industrialization of micro-scale and nano-scale metal powder materials for several years. As a first-class enterprise providing a variety of different metal materials for advanced manufacturing industry, the company's products cover high en-tropy (medium entropy) alloy powder, high-temperature alloy powder, self-fusing alloy powder, memory alloy powder, precision soft magnetic alloy powder, spraying powder, nickel alloy powder, cobalt alloy powder, copper alloy powder, high-strength steel powder, tool steel powder, structural steel powder, stainless steel powder, amorphous material powder, shielding absorbing material powder, titanium alloy aluminum alloy powder, A series of high-quality metal powders for 3D printing, such as high-nitrogen steel, duplex steel powders, etc. The company has established long-term cooperative relations with customers in more than 40 countries and regions such as North America, Europe and the Middle East, and is in a leading position in the industry.

At present, our company has passed a number of certifications such as lSO9001, ISO14001, ISO45001; With a global vision, Lonwin Chemical Industry will continue to innovate in technology, strengthen breakthroughs in low-carbon, green and recyclable materials and production processes, provide customers with high-quality and low-cost metal powders, and actively promote the industrialization of the 3D printing industry.

Ultrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic ComponentsUltrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic ComponentsUltrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic ComponentsUltrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic ComponentsUltrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic ComponentsUltrafine Titanium Silicide Nano Powder for Semiconductor Thin Films and Electronic Components

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